Month: October 2022

Atomic layer deposition

Advantages and limitations of the Atomic layer Deposition

Atomic layer deposition is a method of producing and depositing high-quality ultra thin films in a controlled manner. The significance of atomic layer deposition is not restricted to providing ultra thin films; it also provides 3D structures which can be covered with a firm coating for high aspect-ratio structures. Atomic layer deposition is applicable in […]

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